PRODUCTS

Ion Beam system

By combining high-performance components from around the world with our in-house planning and design technologies, we provide unique ion beam system that can be customized to client specifications.

KRI Ion Sources

We offer KRI ion sources from the United States, developed by Dr. Kaufman. Compatible with a wide range of applications such as sputtering, etching, cleaning, and ion-assisted deposition.
Ion Beam Etching/Milling system

Uses DC/RF ion sources. IBE/milling system equipped with a rotating, cooled substrate stage. Available in the compact, highly expandable J440 Series.
Ion Beam Sputtering system

We offer system that use RF ion sources to achieve low-contamination, high-density thin film deposition with precise thickness control under high vacuum.
Gas Cluster Ion Beam Sources

Generates gas cluster ion beams (GCIB) consisting of clusters of hundreds of atoms, enabling nanoscale processing, damage-free ultra-smooth surface finishing, and reactive gas treatment.
Gas Cluster Ion Beam (GCIB) Application system

GCIB sources fused with our in-house design technologies. These application system are designed and built to meet the specific needs of each client.

The Kaufman Ion Source and Dr. Harold Kaufman

At the core of our ion beam system is the Kaufman-type ion source, a technology shaped by one of the field’s most influential figures, founder Dr. Harold Kaufman.

Dr. Harold Kaufman

Building on his research at NASA, Dr. Kaufman developed the Kaufman-type broad ion source, which came to be used not only in aerospace, but also widely across the electrical and electronics industries as an ion source for ion beam etching and ion beam sputtering.

Earned a Ph.D. from Colorado State University in 1971
Served as chair of the Department of Physics at Colorado State University from 1978 until his retirement
Retired from the university in 1984 and founded Kaufman & Robinson, Inc.

Dr. Kaufman was inducted into the NASA Glenn Research Center Hall of Fame in 2016. NASA recognized the founder of KRI as a trailblazer of ion propulsion, stating that he had “the rare distinction of inventing an experimental spaceflight hardware system that has not only been demonstrated in testing but is being used in space flights today.”