Optical Endpoint Detectors

System Overview

Real-Time Etch Process Monitoring
High-Precision Endpoint Detection

Verity spectrographs (SD1024/SD2048 Series) achieve endpoint detection for all dry etching processes as well as ion beam etching. These system are essential for precise process control.

Compatible Processes

The Spectrograph SD1024 Series optical endpoint system can monitor etch processes in real time. It accurately detects when target layers are reached, contributing to improved yield and process stability.

Compatible Applications	Plasma etching, ion beam etching, ashing/photoresist stripping, plasma ion implantation, CVD, CMP, bevel etching, reactive sputtering
Industries Used	Semiconductor Processes

System Features

Cutting-edge Detection Algorithms and Software Control

Real-Time Monitoring

The Spectrograph SD1024 Series optical endpoint system can monitor etch processes in real time.

Software Features

The included SpectraView software monitors and analyzes collected spectral data and configures endpoint detection algorithms.

Advanced Algorithms

A range of powerful algorithms supports fine-scale processes, such as Verity’s proprietary endpoint trace generation algorithm and detection algorithms using EP Designer and Neural Network.

Reliability and System Integration

SpectraView™ supports a range of protocols such as RS232C/Digital I/O/Ethernet, providing communication protocol tailored to your needs.

EP Designer Multi-Wavelength Algorithm

Features a built-in library that can identify film types from composite wavelength data within a specified time frame.

Specifications and Product Range

SD1024 Series Endpoint Detectors

This system is offered as the SD1024 Series and is available in 2 hardware configurations: the G Series (Windows PC control) and the X Series (built-in PC).
SD1024 Series endpoint detectors are configured with the following hardware specifications.

Hardware specifications
G Series and X Series

Type
Available in models such as SD1024/SD2048

Hardware specifications

G Series (Windows PC Control)

Type	SD1024G/GH	SD2048GH	SD1024GM	SD2048GM	SD1024GL	SD2048GL	SE1024GL-CMOS
CCD specifications	74mm² backthinned, cooled		25mm² high-sensitivity UV dynamic range type		5.7mm² high-sensitivity UV dynamic range type		5.7mm² high-sensitivity UV type
Resolution	< 1.87nm	< 1.0nm	< 1.87nm	< 1.0nm	< 2.0nm	< 1.0nm	< 2.0nm
Minimum exposure time (standard A/D)	13ms	7ms	2ms	2ms	6ms	6ms	2ms
Wavelength Range	200 ~ 800nm or 200 ~ 900nm				200 ~ 800nm
Size (mm)	H 142 × W 137.2 ×L 259						H 102 × W 137.2 × L 191
Weight	3kg						1.6kg
Fiber	Custom-built by Verity				SAM905
No. of Input Channels	Up to 8 fibers		Up to 3 fibers		1 fiber
I/F	USB or Ethernet
Power Specifications	20 – 28 VDC、45W

X Series (Built-In PC)

Type	SD1024X/XH	SD2048XH	SD1024XM	SD2048XM	SD1024XL	SD2048XL
CCD specifications	74mm² backthinned, cooled		25mm² high-sensitivity UV dynamic range type		5.7mm² high-sensitivity UV dynamic range type
Resolution	< 1.87nm	< 1.0nm	< 1.87nm	< 1.0nm	< 2.0nm	< 1.0nm
Minimum exposure time (standard A/D)	13ms	7ms	2ms	2ms	6ms	6ms
Wavelength Range	200 ~ 800nm or 200 ~ 900nm				200 ~ 800nm
Size (mm)	H 142 × W 137.2 × L 259					H 102 × W 137.2 × L 191
Weight	3.4kg					1.6kg
Fiber	Custom-built by Verity				SAM905
No. of Input Channels	Up to 8 fibers		Up to 3 fibers		1 fiber
I/F	USB or Ethernet
Power Specifications	20 – 28 VDC、45W

SP2100 Spectral Reflectometer

Main Features
Combines an SD1024 with a xenon lamp to measure thin films and other layers on wafers.

Design Applications
Designed for in-situ film thickness measurement in etch and CVD applications, as well as metal or transition breakthrough detection in CMP.

Item	Details
Wavelength Range	Standard: 225–800nm Optional: <225–800nm
Measurement Algorithms	Supports fringe count and reflectance model-based algorithms
Environmental Compliance	RoHS compliant

SD1024 Spectrometer Features

・Excellent UV sensitivity
・Excellent signal-to-noise ratio
・Wide dynamic range
・Multi-fiber input capability (application-dependent)

Flash Lamp Features

・Enables in-situ measurement through plasma differences
・Capable of acquiring still images from moving wafers
・Delivers high brightness with excellent signal-to-noise ratio

SpectraView™ Features

・Stable endpoint detection
・Supports etch depth and film thickness algorithms
・Provides flexible open algorithms and sequences
・Supports tool integration via Ethernet, RS232, and DI/O

SD512GR Near-Infrared Spectrometer

Main Features
Can be used for endpoint detection, fault detection, process diagnostics, and as part of a spectral reflectance measurement system.

Chemical Applications
Applicable to chemical reaction monitoring and quality inspection of chemical/pharmaceutical intermediates, and finished chemical and pharmaceutical products.

Item	Details
Wavelength Range	Covers 900–1700nm