PRODUCTS

Ion Beam Sputtering system

System Overview

IBS system for High-Density, Low-Impurity Thin Film Deposition

This system uses RF ion sources and is equipped with a single or planetary stage for ion beam sputtering (IBS).

System Features

Ion Beam Sputtering system (IBS system)

IBS system offer the following outstanding features to meet our customers’ advanced film deposition needs.

High-Quality, High-Density Deposition and Low-Temperature Processing

High-Vacuum Deposition

The process operating pressure is in the 10⁻²Pa range, enabling high-vacuum deposition. This 10⁻²Pa-range deposition vacuum results in dense film deposition with fewer impurities than evaporation or conventional sputtering system.

High Quality

A clean deposition environment with minimal contamination. Capable of depositing high-density films.

Low-Temperature Processing

Capable of unheated deposition at temperatures below 100°C.

Versatile Material Compatibility and Film Quality Control

Material Compatibility

Sputter ion sources and assist ion sources enable oxide and nitride film deposition.

Film Quality Control

Film stress can be adjusted using the assist beam.

Compatible with multi-faced targets

Excellent film thickness control

Custom Design and Monitoring

Custom Design

Chamber design can be tailored to substrate size and quantity.

Film Thickness Gauge

A transmissive optical monitor and a quartz thickness gauge can be installed.

Other Features

Supports reactive film deposition and ion beam-assisted (add-on) deposition

Capable of highly precise film thickness control

Optical Ion Beam Sputtering system (Optical IBS system)

This product line offers all the capabilities of standard ion beam sputtering (IBS) system, with enhanced film deposition accuracy, particularly for optical thin films.

Key Features and Capabilities

Wavelength Range

Film Deposition System for Visible to Infrared Wavelengths
In-situ measurement using a transmission-type film thickness gauge is reflected into the deposition software, enabling control at any desired transmittance.

Deposition vacuum in the 10⁻²Pa range

Fewer impurities than evaporation or conventional sputtering system, enabling dense optical thin film deposition

Compatible with oxide multilayer deposition using RF ion sources

The assist ion beam accelerates oxidation and enables stress adjustment

In-situ film thickness measurement using a wavelength-tunable laser transmissive thickness gauge

Excellent film thickness control with low deposition rates

Based on spectral data from the tunable laser transmissive thickness gauge, Yoshikawa Trading’s deposition software enables control at any desired transmittance

Macleod design data can be imported into the deposition software for film deposition

Deposition Control Methods

The extremum, arbitrary transmittance, and timed automatic deposition modes control the sequencer, ion source output, and optical film thickness gauge to perform a series of processes including vacuum pumping, automatic film deposition, and transmission spectrum measurement.