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Gas Cluster Ion Beam Sources

Gas Cluster Ion Beam Sources

System Overview

The Key System for Damage-Free, Ultra-Smooth Surface Processing

Generates GCIB consisting of clusters of hundreds to thousands of atoms. Our high-performance sources deliver low-damage processing through multi-body collisions and nano-level substrate surface smoothing through the lateral sputtering effect.

GCIB Features and Role

Combining ultra-low energy irradiation (a few eV/atom) with the ultra-high density irradiation of clusters, GCIB is ideal for ultra-smooth surface processing and damage-free processing that conventional ion beams cannot readily achieve. GCIB solves technical challenges across a broad range of fields such as nanoscale processing, surface modification, and high-quality thin film formation.

  1. Damage-free processing through ultra-low energy irradiation
  2. Ultra-smooth surfaces (Ra in the range of several nanometers) through lateral sputtering
  3. High-quality thin film formation and surface modification

System Features

Damage-Free Processing and Nano-Level Smoothing

The multi-body collision effect of cluster ions delivers low-damage processing (e.g., 8keV/2000atoms@cluster=4eV)。 The lateral sputtering effect also enables nano-level ultra-smooth surface processing.

High-Purity Beam Generation and Yoshikawa Trading Patented Technology

A magnetic field electrode removes non-cluster species such as monatomic ions to produce a high-purity beam. Part of this technology is patented by Yoshikawa Trading.

Flexible Process Compatibility and Demo Environment

Compatible with a variety of process gases such as Ar, O₂, N₂, CO₂, and SF₆. The beam aperture is 3cm. A demo unit for nano-level smoothing tests is also available for evaluation.

GCIB Sources
(with monomer ion removal and neutralization)

GCIB Sources

Technical Details and Principles

Differences from Single Ion Beams

Differences Between Single Ion Beams and Cluster Ion Beams

Irradiation and Application Cases

Gas Cluster Ion Beam (GCIB) Irradiation and Application Cases

The following application cases demonstrate the outstanding processing capabilities of GCIB.

GCIB Irradiation Processing on Diamond

Before irradiation

After irradiation

CVD Diamond Smoothing

This case demonstrates a dramatic improvement in CVD diamond surface roughness over the pre-irradiation surface, achieving an ultra-smooth finish.

Provided by Dr. Isao Yamada, Professor Emeritus at Kyoto University

GCIB Irradiation Processing on Tungsten Carbide Mold Surfaces

Etching on mold surfaces using SF₆-GCIB irradiation You can check the effect of fine pattern formation and surface modification.

Before GCIB irradiation

After GCIB irradiation

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