PRODUCTS
Gas Cluster Ion Beam Sources
Gas Cluster Ion Beam Sources
System Overview
The Key System for Damage-Free, Ultra-Smooth Surface Processing
Generates GCIB consisting of clusters of hundreds to thousands of atoms. Our high-performance sources deliver low-damage processing through multi-body collisions and nano-level substrate surface smoothing through the lateral sputtering effect.
GCIB Features and Role
Combining ultra-low energy irradiation (a few eV/atom) with the ultra-high density irradiation of clusters, GCIB is ideal for ultra-smooth surface processing and damage-free processing that conventional ion beams cannot readily achieve. GCIB solves technical challenges across a broad range of fields such as nanoscale processing, surface modification, and high-quality thin film formation.
- Damage-free processing through ultra-low energy irradiation
- Ultra-smooth surfaces (Ra in the range of several nanometers) through lateral sputtering
- High-quality thin film formation and surface modification
System Features
Damage-Free Processing and Nano-Level Smoothing
The multi-body collision effect of cluster ions delivers low-damage processing (e.g., 8keV/2000atoms@cluster=4eV)。 The lateral sputtering effect also enables nano-level ultra-smooth surface processing.
High-Purity Beam Generation and Yoshikawa Trading Patented Technology
A magnetic field electrode removes non-cluster species such as monatomic ions to produce a high-purity beam. Part of this technology is patented by Yoshikawa Trading.
Flexible Process Compatibility and Demo Environment
Compatible with a variety of process gases such as Ar, O₂, N₂, CO₂, and SF₆. The beam aperture is 3cm. A demo unit for nano-level smoothing tests is also available for evaluation.
GCIB Sources
(with monomer ion removal and neutralization)
GCIB Sources
Technical Details and Principles
Differences from Single Ion Beams
Irradiation and Application Cases
Gas Cluster Ion Beam (GCIB) Irradiation and Application Cases
The following application cases demonstrate the outstanding processing capabilities of GCIB.
GCIB Irradiation Processing on Diamond
Before irradiation
After irradiation
CVD Diamond Smoothing
This case demonstrates a dramatic improvement in CVD diamond surface roughness over the pre-irradiation surface, achieving an ultra-smooth finish.
Provided by Dr. Isao Yamada, Professor Emeritus at Kyoto University
GCIB Irradiation Processing on Tungsten Carbide Mold Surfaces
Etching on mold surfaces using SF₆-GCIB irradiation You can check the effect of fine pattern formation and surface modification.
Before GCIB irradiation
After GCIB irradiation